• A spiral waveguide
  • A photonic chip integrated to a PCB
  • Coupling light into a spiral waveguide
  • A wide-band MMI

LIVE: MPW 12th Call for Passive Devices with Heaters

The design rules for MPW Run 12 (passive devices with heaters on 340 nm SOI) have been announced.

The sign up deadline is Friday 15th March 2019.

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CORNERSTONE @ PIC International

Dr Callum Littlejohns will be presenting a CORNERSTONE talk at the PIC International Conference on 26-27th March 2019 in Brussels, Belgium. There will also be a CORNERSTONE exhibition stand for you to meet the team. 

Schedule

The 2019 CORNERSTONE MPW schedule has been announced.

 

 

 

CORNERSTONE Multi Project Wafer Run 8 Announced

The design rules for CORNERSTONE multi project wafer (MPW) run 8 on the 220 nm Si / 2 µm BOX SOI platform have been announced. We will offer 2 Si etch processes: 1) a shallow Si etch of 70 nm (grating couplers), and 2) a partial Si etch of 120 nm (rib waveguides). We will also offer a 1 µm thick silicon dioxide top cladding layer.

This call is intended as a test bed for the next active device call on this platform, later in the year.

Once again, a process design kit (PDK) has been made available using Luceda’s IPKISS software, subject to purchasing the appropriate license. To obtain a copy of the software and a license key, please contact Luceda by sending an email to This email address is being protected from spambots. You need JavaScript enabled to view it., specifying that you require a license for CORNERSTONE PDK usage. Of course, the CORNERSTONE PDK is free of charge if you already have a valid IPKISS license.  

Access to this run is free of charge for UK research institutes (funded by EPSRC). Overseas universities and industrial companies can access this run with the following cost options:

Design area: 11.47 mm x 4.9 mm = £5,000.

Design area: 5.5 mm x 4.9 mm = £3,500.

The mask submission deadline is Friday 31st August 2018.

For more information on future calls, visit the Schedule & Cost page.