MPW Design Rules


On this page you will find all of the technical information and design rules relating to our MPW service. If your requirements differ from our MPW service offerings, we can also provide bespoke fabrication runs. Please email This email address is being protected from spambots. You need JavaScript enabled to view it.


Summary of Live Calls

A summary slide of the current live calls can be downloaded below.


LIVE: Fifth Call Design Rules

CORNERSTONE users are invited to submit designs to the fifth call. The platform is 340 nm Si / 2 µm buried oxide (BOX) silicon-on-insulator (SOI). There will be 3 silicon etches of 140 nm (grating couplers), 240 nm (rib waveguides) and 340 nm (strip waveguides). In addition, there will be a 1 µm top cladding SiO2 layer.

The service is free of charge for UK academia. The cost for non-UK academia is £5,000 for a design space of 11.47 mm x 4.9 mm, or £3,500 for a design space of 5.5 mm x 4.9 mm.

The mask submission deadline is Friday 12th January 2018.

For more information, full design rules and quick reference design rules, please download the CORNERSTONE 5th Call Design Rules documents and the .GDSII template file. 

For any queries, including questions on bespoke processing i.e. custom etch depths etc., please contact This email address is being protected from spambots. You need JavaScript enabled to view it.


LIVE: Fourth Call Design Rules (Active Devices)

CORNERSTONE users are invited to submit mask designs to the fourth call for active device fabrication. This service is offered free of charge to UK research institutions (funded by EPSRC), but non-UK submissions are also welcomed for a charge of £35,000. Due to popular demand, we are also offering a reduced design space of 5.5 mm x 4.9 mm for a discounted charge of £20,000.

The platform for this call is 220 nm Silicon-on-Insulator (SOI) with 3 Si etch depths of 70 nm, 120 nm and 220 nm; 4 Si implants for active device fabrication; a single metal layer for ohmic Si contacts; and 2 metal layers for heaters.

The deadline for mask submission is Friday 1st December 2017.

For more information, full design rules and quick reference design rules, please download the CORNERSTONE 4th Call Design Rules documents and the .GDSII template file.

For any queries, including questions on bespoke processing i.e. custom implants, custom etch depths etc., please contact This email address is being protected from spambots. You need JavaScript enabled to view it.


 Archive: Third Call Design Rules

CORNERSTONE users are invited to submit mask designs to the third call. This service is offered free of charge to UK institutions, but non-UK submissions are also welcomed for a small charge: please contact This email address is being protected from spambots. You need JavaScript enabled to view it. for pricing details.

The platform for this call is 500 nm Silicon-on-Insulator (SOI) with two Si etch depths of 160 nm and 500 nm.

The deadline for mask submission is Friday 28th July 2017. For more information and full design rules, please download the design rules document and .GDSII template file.

For any queries, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.


Archive: Second Call Design Rules

Research institutes are invited to submit designs to the second CORNERSTONE call. This service is offered free of charge to UK institutions, but non-UK submissions are also welcomed for a small charge: please contact This email address is being protected from spambots. You need JavaScript enabled to view it. for pricing details.

The platform for this call is 220 nm Silicon-on-Insulator (SOI) with two Si etch depths of 70 nm and 220 nm. There is also the option of metal heaters.

The deadline for mask submission is Friday 30 June 2017. For more information and full design rules, please download CORNERSTONE 2nd Call Design Rules document and .GDSII template file.

For any queries, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.


Archive: Second Call Training Slides

The CORNERSTONE project has published some training slides for those who would like more assistance with the design rules, and those who are new to mask design, and silicon photonics fabrication. The slides can be downloaded here


Archive: First Call Design Rules

The design rules from the CORNERSTONE first call are available here for your reference. Samples were shipped on 8th May 2017, to arrive before the 10th May 2017 deadline.