Jonathan joined the Surrey Ion Beam Centre as Professor of Ion Implantation Technology in March 2017 after spending 25 years in the semiconductor equipment industry, 21 of those in ion implantation with Applied Materials and Varian Semiconductor Associates. He held senior management positions in the UK and USA leading the technical development of implantation equipment and collaborated with universities and companies in USA, China, Korea, Australia, Europe and UK in research on implantation based processing of advanced memory devices, ultra-shallow transistor junctions, solar cells and solar glass. He holds over 30 granted US patents in the field of ion implantation.
Jonathan has been an industrial mentor for the Surrey University Ion Beam Centre Steering Committee, European SPIRIT Programme (Support of Public and Industrial Research using Ion Beam Technology), and the “Amorphous Chalcogenide-Based Optoelectronic Platform for Next Generation Optoelectronic Technologies” with Surrey, Southampton and Cambridge Universities.
After obtaining his degrees in physics and nuclear physics at the University of Manchester, Jonathan spent his early career working with ion beams in isotope mass spectrometry at Vacuum Generators and then Columbia University.