DUV Lithography Job Request Form

How many wafers do you require?*

Substrate & layer stack*

Will you provide the wafers?* I will provide the wafers
I need you to supply the wafers

Please select the required resist thickness 680 nm
1 um
1.3 um

What is the title of the reticle to expose?*

Which parts of the reticle should be exposed?*

What is the x-pitch on the wafer between shots (mm)?*

What is the y-pitch on the wafer between shots (mm)?*

If the exposure dose you require is known, please enter it here

Please specify the critical dimension*

What is the nature of the critical dimension?* Trench
Resist feature

Please supply the coordinates of the critical dimension in the GDS file*

Please select the tolerance on the critical dimension* ±15nm
±30nm
±50nm
±100nm

Do you have any other comments?

Do you require alignment or is this a first print job?* Alignment required
First print job

Please enter the coordinates of the alignment marks on the wafer

Is the centre of the design at the centre of the shot? Yes
No

Is there any rotation relative to the wafer notch? Yes
No

What is at the centre of the wafer? Centre of shot (odd-odd shot map)
Middle line of X and gap between Y (odd-even shot map)
Middle line of Y and gap between X (even-odd shot map)
Gap between both X&Y (even-even shot map)
Other (give details in comments)

Please use this form to request access to CORNERSTONE's DUV lithography service.

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