updated 10:56 AM UTC, Nov 16, 2021

SiN MPW 2nd Call

CORNERSTONE users are invited to submit designs to the second SiN MPW call.

A process design kit (PDK) is available using Luceda’s IPKISS software, subject to purchasing the appropriate license. To obtain a copy of the software and a license key, please contact Luceda by sending an email to This email address is being protected from spambots. You need JavaScript enabled to view it., specifying that you require a license for CORNERSTONE PDK usage. Of course, the CORNERSTONE PDK is free of charge if you already have a valid IPKISS license.  

Access to this run is free to UK academia. We are grateful to Compugraphics (www.compugraphics-photomasks.com/) who are supporting the CORNERSTONE 2 project with discounted reticles/masks. Other access to this run is charged with the following cost options:

Design Area Cost with heaters Cost without heaters
11.47 mm x 15.45 mm £10,200 £5,200

The sign-up deadline is Friday 10th December 2021. The mask submission deadline is Friday 7th January 2022.

Check out our video guides to learn more about the SiN Platform. In video one, Thalia explores the capabilities, applications and how CORNERSTONE will work with you, to take your research to the next level, using the Silicon Nitride platform. 

In our second video, you can get a speedy run down on the platform's key design rules in a handy one minute guide. 

For more information, full design rules and quick reference design rules, please download the CORNERSTONE SiN 2nd Call Design Rules documents and the .GDSII template files. You can also download the measured SiN refractive index data to assist with your modelling.

In order to help you ensure that you comply with the design rules, you can also download a design rule check (DRC) checklist and if you have access to Tanner L-Edit software, a .tdb version of the template containing a DRC file that you can run to automatically find any design rule violations (note that the automatic DRC will not check all of the design rules, so it remains very important to read the design rules in detail).

For any queries, including questions on bespoke processing i.e. custom etch depths etc., please contact This email address is being protected from spambots. You need JavaScript enabled to view it.