updated 12:09 PM UTC, Sep 18, 2020

DUV Lithography Service

We offer an affordable and efficient deep-UV projection lithography service for 8” (200 mm) substrates.

We offer an affordable and efficient deep-UV projection lithography service for 8” (200 mm) silicon based substrates, capable of patterning 200 nm features.

The service is currently free-of-charge to UK academics, funded by EPSRC under the CORNERSTONE 2 programme. UK academics will only be charged for the reticle and substrate cost (if applicable).

The below video shows the lithography process in action.

 

Cost:

Item

Cost industry (£)

Cost international academic (£)

Cost UK academic (£)

Setup & 1st wafer

£2,500

£1,000

£0

Each additional wafer

£175

£75

£0

Example cost per batch:

Number of Wafers

Cost industry (£)

Cost international academic (£)

Cost UK academic (£)

1

£2,500

£1,000

£0

10

£4,075

£1,675

£0

25

£6,700

£2,800

£0

Reticle cost:

Mask Grade

Pellicle*

Address Size Reticle (µm)

Min. Feature Size Reticle (µm)

Min. Feature Size Wafer (µm)†

CD Tolerance Reticle (µm)

Defect Density (µm)

Cost (£)

Standard

No

0.0625

2

0.5

0.15

0>1.0

£790

High

No

0.005

0.8

0.2

0.08

0>0.5

£1,350

Ultra-High

No

0.005

0.5

0.125

0.03

0>0.25

£2595

Standard

Yes

0.0625

2

0.5

0.15

0>1.0

£955

High

Yes

0.005

0.8

0.2

0.08

0>0.5

£1,580

Ultra-High

Yes

0.005

0.5

0.125

0.03

0>0.25

£2,935

*A pellicle is a protective film which is placed out of the focal plane on the reticle to protect it from dust and other particles. This is typically only used for production reticles which are frequently used.

†The feature size is shrunk by 4x on the wafer relative to the reticle. Users should submit their gds file with dimensions as on the wafer. The mask shop will perform the 4x expansion of feature size.

For design rule guidelines and design submission instructions, please contact us.