A new state-of-the-art E-beam lithography facility has been officially opened at the University of Southampton, marking a significant enhancement to the UK’s national semiconductor and silicon photonics infrastructure.

The facility—housed within CORNERSTONE at the University’s Optoelectronics Research Centre (ORC)—was inaugurated by the UK’s Science Minister, Lord Patrick Vallance, during a recent visit to the campus. He was joined by University Vice-Chancellor Professor Mark E. Smith, Professor Graham Reed, Director of both the ORC and CORNERSTONE, and Mr Osamu Wakimoto, Managing Executive Officer at Japan Electron Optics Laboratory (JEOL).

Lord Vallance said:

“Britain is home to some of the most exciting semiconductor research anywhere in the world – and Southampton’s new E-beam facility is a major boost to our national capabilities.
By investing in both infrastructure and talent, we’re giving our researchers and innovators the support they need to develop next-generation chips right here in the UK.
Our £4.75 million skills package will support our Plan for Change by helping more young people into high-value semiconductors careers, closing skills gaps and backing growth in this critical sector.”

The new E-beam lithography facility is just the second in the world, and first outside Japan. It features cutting-edge lithography equipment from JEOL, a global leader in scientific instrumentation. Systems installed include the JEOL JBX-8100FS 200 kV and the JEOL JBX-A9 100 kV e-beam lithographic systems, along with the JEOL IT-800i Schottky Field Emission Scanning Electron Microscope (SEM), designed for precise characterisation of semiconductor processes.

E-beam lithography is a key enabling technology for fabricating nanoscale photonic and electronic devices. It uses a finely focused beam of electrons to write intricate patterns with nanometre precision—essential for next-generation applications ranging from healthcare and communications to defence systems. The JBX-8100FS, in particular, supports high-resolution and high-throughput patterning, supporting small- to medium-scale production with unprecedented detail.

Professor Graham Reed commented:

“The introduction of the new E-beam facility will reinforce our position of hosting the most advanced cleanroom in UK academia. It facilitates a vast array of innovative and industrially relevant research, and much-needed semiconductor skills training.”

The installation advances CORNERSTONE’s mission to accelerate the development and commercialisation of silicon photonics technologies by providing researchers and industry with access to world-class nanofabrication capabilities. By closely emulating industrial SiPh manufacturing processes, the new facility helps address challenges related to scaling and integration, bridging the gap between prototype development and high-volume production.